Fundamentals of MOS and bipolar microelectronic circuit fabrication; theory and practice of diffusion, oxidation, ion implantation, photolithography, etch; yield and reliability considerations; statistical process control; integrated process design, simulation and characterization. Prerequisites: Grade of C or better in ECEN 325 and ECEN 370; junior or senior classification Credits 4. 3 Lecture Hours. 3 Lab Hours.
Fundamentals of MOS and bipolar microelectronic circuit fabrication; theory and practice of diffusion, oxidation, ion implantation, photolithography, etch; yield and reliability considerations; statistical process control; integrated process design, simulation and characterization. Prerequisites: Grade of C or better in ECEN 325 and ECEN 370; junior or senior classification Credits 4. 3 Lecture Hours. 3 Lab Hours.
